| 세션명 | Molecular Electronics Division (I) (English) |
|---|---|
| 발표장 | 제1회장 (300A) |
| 논문코드 | 1L1-7 |
| 발표일 | 2018-10-11 |
| 발표시간 | 16:30-17:00 |
| 논문제목 | ~10 nm scale nanolithography and its applications to display, sensor and catalyst |
| 발표자 | Hee-Tae Jung |
| 발표자 소속 | Korea Advanced Institute of Science and Technology |
| 저자 | Hee-Tae Jung† |
| 소속 | Korea Advanced Institute of Science and Technology |
| 논문초록 | The development of large-area, high-resolution nano-patterning with high-aspect-ratios is a challenging problem that must be solved for potential applications in high performance nanoscale devices. To date, nano-imprinting, and soft-, e-beam, dip-pen (DPN), and soft-building block-lithography have been primarily used in such applications. Here, we describe two new patterning techniques that enables fabrication of ultra high-resolution and high-aspect-ratio patterns of various shapes. First, we introduce an advanced ultrahigh-resolution (ca. 15 nm) patterning technique that enables the fabrication of various 3D high aspect ratio (ca. 10) multi-components/shaped nanostructures. This methodology utilizes the repetitive secondary sputtering phenomenon under etching plasma conditions and prepatterned fabrication control. This method provides many strategies to fabricate complex continuous patterns and multilayer/material patterns with 10 nm-scale resolution. |
THE POLYMER SOCIETY OF KOREA